Study of particle transport in high pressure sputter deposition process takeo nakano december 2001. The design and modification of a sputter system for dc reactive sputtering of alumina and zirconia thin films a thesis submitted to the graduate faculty of the. Characterization of uncoated and sputter coated nanofibers a thesis presented to the graduate faculty of the university of akron in partial fulfillment.
Ii abstract of thesis antibacterial effects of sputter deposited silver-doped hydroxyapatite thin films over recent years, researchers have studied innovative ways to increase the. 1 1 magnetic field strength influence on the reactive magnetron 2 sputter deposition of ta 2 o 5 3 r hollerweger1,3, d holec2, j paulitsch1,3, r rachbauer4, p polcik5 and p h 4 mayrhofer1,3. Thin-film transistors fabricated using sputter deposition of zno by nan xiao a thesis submitted in partial fulfillment of the requirements for the degree of master of science. Fabrication and study of ito thin films prepared by magnetron sputtering dissertation zur erlangung des grades doktor der naturwissenschaften.
Sputtering fabrication of silicon nitride and publicly paper and electronic copies of this thesis document in whole sputtering is a physical vapor deposition . Magnetron sputtering has become the process of choice for the deposition of a wide range of industrially important coatings examples include hard, wear-resistant coatings, low friction coatings, corrosion resistant coatings, decorative coatings and coatings with specific optical, or electrical properties. The aim of this thesis is to study the fundamental concepts of the sputtering process and to investigate the thickness distribution and crystal structure of the sputter-deposited chapter 1. Santhosh kumar pandian preparation and characterization of titanium based coatings by direct-current (dc) magnetron sputtering process master of science thesis. Thin film deposition physical vapor deposition (pvd) - film is formed by atoms directly transported from source to the substrate through gas phase • sputtering.
This thesis consists of molecular dynamics studies of several sputtering topics not directly related to each other and is organized accordingly into separate chapters each of these chapters will be a summary of corresponding publications published by the author during the course of his graduate study. Reactive sputtering: when a reactive gas is intentionally included to the sputtering system then the sputtering process is called reactive sputtering a reaction may occur during the deposition of the film either at the cathode or at the surface. Iii abstract of thesis differential sputtering yields of refractory metals by ion bombardment at normal and oblique incidences currently, the problems of sputter erosion and spacecraft contamination due to deposition of. Experimental and modeling studies of low-energy ion sputtering for ion thrusters michael r nakles (abstract) this thesis investigates low-energy xenon-molybdenum (xe+-mo) sputtering. Isotopic fractionation in sputtering thesis by stephen james spicklemire in partial fulfillment of the requirements for the degree of doctor of philosophy.
This thesis provides a fraction of this understanding, and may “high power impulse magnetron sputtering (hipims) pre-treatment for the deposition of hard. 1 sputter deposition processes d depla 1, s mahieu 1, je greene 2 1 ghent university, department of solid state sciences, krijgslaan 281 (s1), 9000 ghent, belgium 2 materials science and physics departments and the frederick seitz materials. Aluminum nitride films by reactive sputtering by alvin g randolph, iii a thesis submitted in partial fulfillment ofthe requirements for the degree of master ofscience in materials science and engineering at the rochester institute oftechnology. The properties of sputtered copper oxide thin film a thesis submitted in magnetron sputtering was investigated by correlating the copper oxide plasma and. Stamate, dielectric properties of tio2 thin films deposited by a dc magnetron sputtering system, thin solid films, 372, 246–249, 2000 11 m.
Sputter deposition of thin-film capacitors onto low temperature co-fired ceramic substrates by jack edwin murray a thesis presented to the faculty of the graduate school of the. Characterization of rf and dc magnetron reactive sputtered tio2 thin films for gas sensors for further information about the rf sputtering deposition technology and. Study of properties of aln thin films deposited by reactive magnetron sputtering neelam sputtering is the most common deposition process.
I have to sputtering al2o3 for a new project for my bachelor-thesis i tried various conzentrations, temeratures and power the best results i achieved with 400°c, 20min, 60w, but the layer . Sputtering of titanium target at various sputter powers in the range 80 - 200 w the as-deposited films were structural, dielectric and optical properties of . Study of indium tin oxide (ito) for novel optoelectronic devices phd thesis by shabbir a bashar 32 ito deposition by reactive rf sputtering.
Pvd methods, sputtering has been focused upon in the present thesis, since all the samples studied in the thesis were deposited using this technique although there are many variants of. 1 development of low temperature alpha alumina coatings by ac magnetron sputtering a thesis submitted in partial fulfillment of the requirements for the honors program, for the degree of.